Wood, traditionally used as raw material for paper, is now being explored as a potential source for semiconductor photoresists. According to a report by Nikkei, Japanese papermaker Oji Holdings is ...

Sunfort™ dry film photoresist is a mainstay of Asahi Kasei’s Electronics business, comprising electronic materials and components. The entity is positioned as a First Priority business to drive growth ...

The intricate process of photoresist development encompasses raw material synthesis and formulation refinement, with the synthesis and purification of photoresist raw materials posing significant ...

CORVALLIS, Ore.--(BUSINESS WIRE)--Inpria, a pioneer in high-resolution metal oxide photoresists for extreme ultraviolet lithography (EUV), today announced that it has secured $31 million in Series C ...

Most discussions of advanced lithography focus on three elements — the exposure system, photomasks, and photoresists — but that’s only part of the challenge. Successfully transferring a pattern from ...

Researchers of Karlsruhe Institute of Technology (KIT) and Heidelberg University have developed a photoresist for two-photon microprinting. It has now been used for the first time to produce ...

UPTON, NY—A process for making hybrid organic-inorganic materials (photoresists) sensitive to extreme-ultraviolet (EUV) light is one of two technologies that won the 2021 National Labs Accelerator ...

Asahi Kasei has developed the Sunfort TA series of dry film photoresist for next-generation semiconductor packages requiring circuit patterns with line/space widths of 2/2 µm or less. The film offers ...

CORVALLIS, Ore.--(BUSINESS WIRE)--Inpria, a pioneer in high-resolution metal oxide photoresists for extreme ultraviolet lithography (EUV), today announced that it has secured $31 million in Series C ...

Researchers have developed a photoresist for two-photon microprinting. It has now been used for the first time to produce three-dimensional polymer microstructures with cavities in the nano range. The ...